| 发明名称 |
COVER FOR A SUBSTRATE TABLE, SUBSTRATE TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD |
| 摘要 |
A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.
|
| 申请公布号 |
US2011228248(A1) |
申请公布日期 |
2011.09.22 |
| 申请号 |
US201113047251 |
申请日期 |
2011.03.14 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LAFARRE RAYMOND WILHELMUS LOUIS;ROSET NIEK JACOBUS JOHANNES;ZDRAVKOV ALEXANDER NIKOLOV;STOUWDAM JAN WILLEM;BIJL BERNARDUS LAMBERTUS JOHANNES |
| 分类号 |
G03B27/58 |
主分类号 |
G03B27/58 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
