发明名称 |
LASER IRRADIATION METHOD AND LASER IRRADIATION APPARATUS |
摘要 |
An object of the present invention is to provide a laser irradiation method and a laser irradiation apparatus for irradiating an irradiation surface with a linear beam having more homogeneous intensity by blocking a low-intensity part of the linear beam without forming the fringes due to the diffraction on the irradiation surface. In the laser irradiation, a laser beam emitted from a laser oscillator 101 passes through a slit 102 so as to block a low-intensity part of the laser beam, the traveling direction of the laser beam is bent by a mirror 103, and an image formed at the slit is projected to an irradiation surface 106 by a convex cylindrical lens 104. |
申请公布号 |
EP1728271(A4) |
申请公布日期 |
2011.09.21 |
申请号 |
EP20050727734 |
申请日期 |
2005.03.24 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
TANAKA, KOICHIRO;YAMAMOTO, Y.OSHIAKI |
分类号 |
H01L21/268;B23K26/00;B23K26/06;B23K26/073;H01L21/20;H01L21/336;H01L21/77;H01L21/84;H01L29/786 |
主分类号 |
H01L21/268 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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