| 摘要 |
<p>A plurality of nonvolatile memory cells comprising: a first plurality of substantially parallel, substantially coplanar conductors extending in a first direction; a first plurality of diodes; a first plurality of resistance-switching elements; and a second plurality of substantially parallel, substantially coplanar conductors extending in a second direction different from the first direction, wherein, in each memory cell, one of the first diodes and one of the first resistance-switching elements are arranged in series, disposed between one of the first conductors and one of the second conductors, and wherein the first plurality of resistance-switching elements comprise a layer of material selected from the group consisting of Ni x O y , Nb x O y , Ti x O y , Hf x O y , Al x O y , Mg x O y , Co x O y , Cr x O y , V x O y , Zn x O y , Zr x O y , B x N y , and Al x N y .</p> |
