发明名称 ANTENNA FOR PLASMA TREATMENT DEVICE, AND PLASMA TREATMENT DEVICE USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a high-frequency antenna for suppressing the shielding of a high-frequency induction electric field and the decay of the intensity when a thin film material is deposited on the surface. <P>SOLUTION: The high-frequency antenna 10 includes a linear antenna conductor 13, a dielectric protection pipe 14 provided around the antenna conductor 13, and a deposit shield 15 provided around the dielectric protection pipe 14 for covering at least one site of the dielectric protection pipe 14 on a selective line in the longitudinal direction of the antenna conductor 13, and having at least one opening 153. The thin film material is deposited on the surfaces of the protection pipe and the deposit shield, but it is disconnected at least on one part in the longitudinal direction of the antenna conductor. This prevents the shielding of the high-frequency induction electric field when the thin film material is conductive one, and suppresses the decay of the intensity of the high-frequency induction electric field when it is another than conductive one. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011181292(A) 申请公布日期 2011.09.15
申请号 JP20100043538 申请日期 2010.02.26
申请人 EMD:KK 发明人 SETSUHARA YUICHI;EBE AKINORI
分类号 H05H1/46;C23C14/34;C23C16/509;H01L21/203;H01L21/3065;H01L21/31 主分类号 H05H1/46
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