METHOD AND DEVICE FOR FORMING STACKED STRUCTURE INCLUDING AMORPHOUS CARBON FILM

摘要

PROBLEM TO BE SOLVED: To provide a method for improving adhesion between an underlayer and an amorphous carbon film. SOLUTION: The method for forming a stacked structure including the amorphous carbon film on the underlayer, includes steps of: supplying an organic silicon gas on the underlayer to form an initial layer including a Si-C bond on the underlayer (t4); and forming the amorphous carbon film on the underlayer with a heating film formation (t6) supplying a film forming gas containing hydrocarbon gas on the underlayer on the surface of which the initial layer is formed. COPYRIGHT: (C)2011,JPO&INPIT