| 发明名称 |
Deposition Chamber Cleaning System and Method |
| 摘要 |
An in-situ method of cleaning a vacuum deposition chamber can include flowing at least one reactive gas into the chamber. |
| 申请公布号 |
US2011223710(A1) |
申请公布日期 |
2011.09.15 |
| 申请号 |
US201113044255 |
申请日期 |
2011.03.09 |
| 申请人 |
FIRST SOLAR, INC. |
发明人 |
BECK MARKUS E. |
| 分类号 |
H01L31/18;B08B9/00;B08B13/00;C23F1/08 |
主分类号 |
H01L31/18 |
| 代理机构 |
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