| 摘要 |
Sample inspection apparatus, sample inspection method, and sample inspection system are offered which can give a stimulus to a sample (20) held on a film (32) when the sample is inspected by irradiating it with a primary beam (7) (e.g., an electron beam or other charged particle beam) via the film. The apparatus has the film (32), a vacuum chamber (11), primary beam irradiation means, signal detection means (4), and a controller for controlling the operations of the beam irradiation means and signal detection means. The sample (20) is held on a first surface (32a) of the film opened to permit access to the film. The vacuum chamber (11) reduces the pressure of the ambient in contact with a second surface (32b) of the film. The irradiation means irradiates the sample with the primary beam via the film from the second surface side. The detection means (4) detects a secondary signal produced from the sample (20) in response to the irradiation (7).
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