发明名称 Semiconductor device and power conversion apparatus using the same
摘要 A semiconductor device provides a gate electrode (401) formed on a lateral face of a wide trench (423), and thereby cover the gate electrode is covered by a gate insulating layer (402) and a thick insulating layer (403) to be an inter layer. Therefore, a parasitic capacitance of the gate becomes small, and there is no potential variation of the gate since there is no floating p-layer so that a controllability of the dv/dt can be improved. In addition, the conductive layer between the gate electrodes can relax the electric field applied to the corner of the gate electrode. In consequence, compatibility of low loss and low noise can be achieved.
申请公布号 EP2365531(A2) 申请公布日期 2011.09.14
申请号 EP20100015210 申请日期 2010.12.01
申请人 HITACHI, LTD. 发明人 WATANABE, SO;MORI, MUTSUHIRO;ARAI, TAIGA
分类号 H01L29/739;H01L21/331;H01L29/06;H01L29/08 主分类号 H01L29/739
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