发明名称 |
Lithographic apparatus with multiple alignment arrangements and alignment measuring method |
摘要 |
A lithographic apparatus has a plurality of different alignment arrangements that are used to perform an alignment measurement on the same mark(s) by: detecting a first alignment mark located on an object and producing a first alignment signal by a first detector; detecting the first mark and producing a second alignment signal by a second detector using a different alignment measurement than the first detector; receiving the first alignment signal from the first detector; calculating a first position of the at least first mark based on the first alignment signal; receiving the second alignment signal from the second detector; calculating a further first position of the at least first mark based on the second alignment signal.
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申请公布号 |
US8018594(B2) |
申请公布日期 |
2011.09.13 |
申请号 |
US20090580564 |
申请日期 |
2009.10.16 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN BILSEN FRANCISCUS BERNARDUS MARIA |
分类号 |
G01B11/00 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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