发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING METHOD
摘要 According to one embodiment, a first substrate and a second substrate are pressed from an opposite surface of a joint surface of the second substrate such that a joint surface of the first substrate and the joint surface of the second substrate are in contact with each other. The second substrate is restrained by a member to provide a gap between the joint surfaces. It is determined, based on a temporal change of a joint interface calculated based on an image imaged from the opposite surface side of the joint surface, whether joining is normally performed.
申请公布号 US2011217795(A1) 申请公布日期 2011.09.08
申请号 US201113035182 申请日期 2011.02.25
申请人 TANIDA KAZUMASA;YAMAGUCHI NAOKO;HONGO SATOSHI;TAKUBO CHIAKI;NUMATA HIDEO 发明人 TANIDA KAZUMASA;YAMAGUCHI NAOKO;HONGO SATOSHI;TAKUBO CHIAKI;NUMATA HIDEO
分类号 H01L21/66;B23P19/00 主分类号 H01L21/66
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