| 发明名称 |
SULFONYL PHOTOACID GENERATOR AND PHOTORESIST INCLUDING THE SAME |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high-resolution image of a submicron-dimention by a photoresist. <P>SOLUTION: There are provided a tri(sulfonyl)methide or bis(sulfonyl)imide photoacid generator compound (PAG) indicated in following formula I or formula II (requirement 1)(requirement 2), and a photoresist composition including the PAG composition. <P>COPYRIGHT: (C)2011,JPO&INPIT |
| 申请公布号 |
JP2011173865(A) |
申请公布日期 |
2011.09.08 |
| 申请号 |
JP20100277563 |
申请日期 |
2010.12.14 |
| 申请人 |
ROHM & HAAS ELECTRONIC MATERIALS LLC |
发明人 |
LIU CONG;XU CHENG-BAI |
| 分类号 |
C07C311/48;C07C317/44;C07C381/12;C09K3/00;G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
C07C311/48 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
