| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic-ray- or radiation-sensitive resin composition that can simultaneously satisfy the requirements for high sensitivity, high resolution, desirable pattern configuration, desirable line edge roughness and desirable iso/dense bias in especially lithography using an electron beam, X-rays or EUV light as an exposure radiation source, and to provide a method of forming a pattern using the composition. <P>SOLUTION: The actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing: a repeating unit (A) that when irradiated with actinic rays or radiation, is decomposed to thereby generate an acid; and at least two types of repeating units (B1), (B2) that when acted on by an acid, are decomposed to thereby generate an alkali-soluble group, wherein the alkali-soluble group generated by the repeating unit (B1) is different from the alkali-soluble group generated by the repeating unit (B2). <P>COPYRIGHT: (C)2011,JPO&INPIT |
