发明名称 |
Method and apparatus for producing semiconductor films and related devices |
摘要 |
A method for producing a semiconductor film having a chalcopyrite structure including a Ib group element, a IIIb group element and a VIb group element including selenium, the method including cracking selenium with plasma to generate radical selenium, and using the radical selenium in the process of forming the semiconductor film.
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申请公布号 |
US8012546(B2) |
申请公布日期 |
2011.09.06 |
申请号 |
US20070843936 |
申请日期 |
2007.08.23 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY |
发明人 |
ISHIZUKA SHOGO;NIKI SHIGERU;SAKURAI KEIICHIRO;YAMADA AKIMASA;MATSUBARA KOJI |
分类号 |
H05H1/24 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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