发明名称 Method and apparatus for producing semiconductor films and related devices
摘要 A method for producing a semiconductor film having a chalcopyrite structure including a Ib group element, a IIIb group element and a VIb group element including selenium, the method including cracking selenium with plasma to generate radical selenium, and using the radical selenium in the process of forming the semiconductor film.
申请公布号 US8012546(B2) 申请公布日期 2011.09.06
申请号 US20070843936 申请日期 2007.08.23
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY 发明人 ISHIZUKA SHOGO;NIKI SHIGERU;SAKURAI KEIICHIRO;YAMADA AKIMASA;MATSUBARA KOJI
分类号 H05H1/24 主分类号 H05H1/24
代理机构 代理人
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