| 摘要 |
An exposure apparatus includes: a first optical member via which an exposure beam exits; a first movable body movable while holding a substrate in a predetermined area; a first holding device releasably holding a first cover member, capable of forming a space retaining a liquid between the first optical member and the first cover member, such that when the first movable body is away from the first optical member, the first cover member is arranged at the position opposite to the exit surface of the first optical member; a second holding device arranged on the first movable body and capable of holding the first cover member released from the first holding device; and a third holding device arranged on the first movable body and releasably holding a second cover member. Deterioration of the performance due to the cover member can be suppressed while suppressing operating rate deterioration.
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