| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a nano imprint method that is excellent in the mold-release characteristic with mold and resin, thus not causing resin pattern-defective or allowing a reduction in it, and to provide mold for use in the same. <P>SOLUTION: The nano imprint method presses a mold 11 having a concavo-convex pattern 12 on its surface onto photo-curable resin 15 on a substrate 14 to be processed, and irradiates light for exposing the photo-curable resin 15 through the mold 11, thus hardening the photo-curable resin 15 and transferring the concavo-convex pattern 12, wherein at least either one of the surface free energy of the mold 11 surface and that of the photo-curable resin 15 surface that has been cured is≥5 and≤30 mJ/m<SP>2</SP>. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
