发明名称 CHARGED PARTICLE BEAM DRAWING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a drawing apparatus for efficiently performing processing when correcting a drawing position with the use of a plurality of correction maps. SOLUTION: The drawing apparatus 100 is equipped with a storage device 142 for storing a plurality of kinds of correction amount map data to correct the drawing position, an extraction part 12 for inputting a plurality of kinds of correction amount map data and extracting partial data to be defined at positions surrounding respective shot positions when performing drawing based on the correction amount map data, a partial map generating part 14 for generating the partial map of each kind of correction amount map data by using the extracted partial data, a synthesizing part 16 for synthesizing a plurality of generated partial maps, and a drawing part 150 for drawing a pattern in a sample by radiating a charged particle beam to the respective shot positions corrected with the use of the correction amount defined in the synthesized synthesis map. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011171510(A) 申请公布日期 2011.09.01
申请号 JP20100033847 申请日期 2010.02.18
申请人 NUFLARE TECHNOLOGY INC 发明人 NAKATA SUMITO
分类号 H01L21/027;H01J37/305 主分类号 H01L21/027
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