发明名称 SILICON CARBIDE SUBSTRATE AND METHOD OF MANUFACTURING SILICON CARBIDE SUBSTRATE
摘要 A SiC substrate includes a first orientation flat parallel to the <11-20> direction, and a second orientation flat being in a direction intersecting the first orientation flat and being different from the first orientation flat in length. An alternative SiC substrate has a rectangular plane shape, and a main surface of the substrate includes a first side parallel to the <11-20> direction, a second side in a direction perpendicular to the first side, and a third side connecting the first side to the second side. A length of the third side projected in a direction in which the first side extends is different from a length of the third side projected in a direction in which the second side extends.
申请公布号 US2011210342(A1) 申请公布日期 2011.09.01
申请号 US201013128438 申请日期 2010.02.09
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 SASAKI MAKOTO;MASUDA TAKEYOSHI
分类号 H01L29/02;B26D1/00 主分类号 H01L29/02
代理机构 代理人
主权项
地址