发明名称 |
FOCUS TEST MASK, FOCUS MEASUREMENT METHOD, EXPOSURE METHOD AND EXPOSURE APPARATUS |
摘要 |
A focus test reticle for measuring focus information includes an outer pattern. The outer pattern has a line pattern composed of a light shielding film extending in the Y direction, a phase shift portion provided on a side in the +X direction of the line pattern and formed to have a line width narrower than the line pattern, a transmitting portion provided on a side in the −X direction of the line pattern and formed to have a line width narrower than the line pattern, a transmitting portion provided on a side in the +X direction of the phase shift portion, and a phase shift portion provided on a side in the −X direction of the transmitting portion. Focus information of a projection optical system is measured at a high measuring reproducibility and a high measuring efficiency.
|
申请公布号 |
US2011212389(A1) |
申请公布日期 |
2011.09.01 |
申请号 |
US20100940292 |
申请日期 |
2010.11.05 |
申请人 |
NIKON CORPORATION |
发明人 |
HIRUKAWA SHIGERU;KONDO SHINJIRO |
分类号 |
G01J1/00;G03B27/52;G03F1/00;G03F7/20 |
主分类号 |
G01J1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|