SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE,申请号KR20110017384-传众专利搜索

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发明名称	SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要
申请公布号	KR20110098680(A)	申请公布日期	2011.09.01
申请号	KR20110017384	申请日期	2011.02.25
申请人	HITACHI KOKUSAI ELECTRIC INC.	发明人	TOYODA KAZUYUKI;KASAHARA OSAMU;HIROSE YOSHIRO;TAKADERA HIROYUKI;KAMIMURA DAIGI
分类号	H01L21/205;H01L21/3065	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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