发明名称 |
POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS |
摘要 |
A polymer comprising recurring units having a fluorinated carboxylic acid onium salt structure on a side chain is used to formulate a chemically amplified positive resist composition. When the composition is processed by lithography to form a positive pattern, the diffusion of acid in the resist film is uniform and slow, and the pattern is improved in LER. |
申请公布号 |
US2011212391(A1) |
申请公布日期 |
2011.09.01 |
申请号 |
US201113035066 |
申请日期 |
2011.02.25 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
MASUNAGA KEIICHI;WATANABE SATOSHI;HATAKEYAMA JUN;OHSAWA YOUICHI;DOMON DAISUKE |
分类号 |
G03F7/20;C08F20/22;C08F20/28;C08F20/38;C08F220/20;G03F1/00;G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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