发明名称 |
LITHOGRAPHIC APPARATUS AND METHOD FOR CORRECTING A POSITION OF AN STAGE OF A LITHOGRAPHIC APPARATUS |
摘要 |
<p>A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.</p> |
申请公布号 |
KR20110097634(A) |
申请公布日期 |
2011.08.31 |
申请号 |
KR20110012271 |
申请日期 |
2011.02.11 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BUTLER HANS;EUSSEN EMIEL JOZEF MELANIE;KOENEN WILLEM HERMAN GERTRUDA ANNA;VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS;VAN DER SCHOOT HARMEN KLAAS;VAN DER WIJST MARC WILHELMUS MARIA;VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS;DE HOON CORNELIUS ADRIANUS LAMBERTUS |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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