发明名称 Semiconductor device, manufacturing method thereof, composite metal body and manufacturing method thereof
摘要 A semiconductor device having a structure in which a semiconductor element and a Cu or Ni electrode are connected by way of a bonding layer comprising Cu, and the Cu bonding layer and the Cu or Ni electrode are diffusion-bonded to each other. The bonding layer is formed by conducting bonding in a reducing atmosphere by using a bonding material containing particles of Cu oxide with an average particle size of 1 nm to 50μm and a reducing agent comprising an organic material, thereby providing excellent bonding strength to Ni or Cu electrode.
申请公布号 US8008772(B2) 申请公布日期 2011.08.30
申请号 US20080019789 申请日期 2008.01.25
申请人 HITACHI, LTD. 发明人 MORITA TOSHIAKI;YASUDA YUSUKE;IDE EIICHI
分类号 H01L23/48 主分类号 H01L23/48
代理机构 代理人
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