发明名称 LIGHT SOURCE SET VALUE ADJUSTMENT METHOD, INSPECTION METHOD, AND INSPECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a light source set value adjustment method, an inspection method, and an inspection device, appropriately adjusting a light source set value of a light source device even when a target object contains a foreign matter. SOLUTION: The target object has a plurality of inspection regions, and each of the inspection regions has a plurality of luminance detection regions. The light source set value adjustment method has: a light irradiation step of sequentially irradiating the inspection regions with a plurality of light beams each having a different light source set value; an imaging step of imaging one of the luminance detection regions of each of the inspection regions; a foreign matter determination step of determining the presence or absence of a foreign matter, based on an imaged image date; a luminance measuring step of measuring, when it is determined that there is no foreign matter, luminance of the luminance detection region and repeatedly conducting, when it is determined that there is a foreign matter, the light irradiation step, the imaging step, and the foreign matter determination step to other luminance detection regions until it is determined that there is no foreign matter; a relation equation operating step of operating a relation equation of each of the light source set values and each luminance thereof; and a light source set value setting step of setting a light source set value, based on the relation equation. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011163805(A) 申请公布日期 2011.08.25
申请号 JP20100024075 申请日期 2010.02.05
申请人 SEIKO EPSON CORP 发明人 HIRAI ATSUSHI
分类号 G01N21/956 主分类号 G01N21/956
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