The invention relates to a liquid-phase method for the thermal production of silicon layers on a substrate, wherein at least one higher silicon that can be produced from at least one hydridosilane of the generic formula SiaH2a+2 (with a = 3 - 10) being applied to a substrate and then being thermally converted to a layer that substantially consists of silicon, the thermal conversion of the higher silane proceeding at a temperature of 500 - 900 °C and a conversion time of = 5 minutes. The invention also relates to silicon layers producible according to said method and to their use.
申请公布号
WO2011061106(A3)
申请公布日期
2011.08.25
申请号
WO2010EP67207
申请日期
2010.11.10
申请人
EVONIK DEGUSSA GMBH;WIEBER, STEPHAN;PATZ, MATTHIAS;CARIUS, REINHARD;BRONGER, TORSTEN;COELLE, MICHAEL
发明人
WIEBER, STEPHAN;PATZ, MATTHIAS;CARIUS, REINHARD;BRONGER, TORSTEN;COELLE, MICHAEL