METHOD OF MANUFACTURING ELECTRO-OPTICAL DEVICE

摘要

PROBLEM TO BE SOLVED: To provide scattering structure of a reflective electrode without increasing the number of mask sheets in a manufacturing process for an electro-optical device.

SOLUTION: This method uses a photosensitive resin film as an interlayer film. Contact holes 103-106 are formed by executing patterning by exposure through the first translucent part 101 of a photomask 100. The photosensitive resin film gets resolution-impossible when exposed through the second translucent part 102 of the photomask 100, and irregularity is generated on a surface of the photosensitive resin film. The contact holes are formed and the scattering structure on a surface of the interlayer film is obtained by one sheet of the photomask in this manner.

COPYRIGHT: (C)2011,JPO&INPIT