发明名称 EXPOSURE HEAD AND IMAGE FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a technology for suppressing the strength of ghost light. SOLUTION: The exposure head includes a reflected light attenuating member disposed between the first and second light emitting chips of a substrate. The optical length of a first imaging optical system has the following relations: h1<h4<h3 and h2<h4<h3, wherein h1 is the length of the first light emitting chip in the direction of an optical axis, h2 is the length of the second light emitting chip in the direction of the optical axis, h3 is a distance between the substrate and a light shielding portion in the direction of the optical axis, and h4 is the length of the reflected light attenuating member in the direction of an optical axis. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011161631(A) 申请公布日期 2011.08.25
申请号 JP20100023083 申请日期 2010.02.04
申请人 SEIKO EPSON CORP 发明人 SOWA KEN;IKUMA TAKESHI
分类号 B41J2/44;B41J2/45;B41J2/455;G03G15/04;H04N1/036 主分类号 B41J2/44
代理机构 代理人
主权项
地址
您可能感兴趣的专利