RETARGET PROCESS MODELING METHOD, AND METHOD FOR FABRICATING MASK USING THE SAME MODELING METHOD

摘要

PURPOSE: A retarget process modeling method, and a method for fabricating mask using the same modeling method are provided to generate improved process model reflecting real PR flow rate by performing a retarget process modeling in consideration of the density of an SRAF pattern interfering PR flow rate. CONSTITUTION: In a retarget process modeling method, and a method for fabricating mask using the same modeling method, a predication data of a desk layout using a conventional process model(S110). Corresponding features which is interfered by PR flow are secured by using bias data(S120). A kernel including a PR flow kernel considering an SRAF(Sub Resolution Assist Feature) is generated(S130). An improved process model is obtained by applying an un-calibrated model to measured data and fitting(S140).