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发明名称
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM WITH REDUCED OUTGASSING
摘要
申请公布号
KR20110095362(A)
申请公布日期
2011.08.24
申请号
KR20117013818
申请日期
2009.11.19
申请人
NISSAN CHEMICAL INDUSTRIES, LTD.
发明人
SAKAMOTO RIKIMARU;HO BANGCHING;ENDO TAKAFUMI
分类号
G03F7/11
主分类号
G03F7/11
代理机构
代理人
主权项
地址
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