发明名称 |
Intensity selective exposure method and apparatus |
摘要 |
A gradated photomask is provided. The photomask includes a first region including a first plurality of sub-resolution features and a second region including a second plurality of sub-resolution features. The first region blocks a first percentage of the incident radiation. The second region blocks a second percentage of the incident radiation. The first and second percentage are different. An intensity selective exposure method is also provided.
|
申请公布号 |
US8003303(B2) |
申请公布日期 |
2011.08.23 |
申请号 |
US20090421378 |
申请日期 |
2009.04.09 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD |
发明人 |
LIU GEORGE;CHEN KUEI SHUN;YEH CHIH-YANG;HUANG TE-CHIH |
分类号 |
G03F7/00;G03F1/00 |
主分类号 |
G03F7/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|