发明名称 Intensity selective exposure method and apparatus
摘要 A gradated photomask is provided. The photomask includes a first region including a first plurality of sub-resolution features and a second region including a second plurality of sub-resolution features. The first region blocks a first percentage of the incident radiation. The second region blocks a second percentage of the incident radiation. The first and second percentage are different. An intensity selective exposure method is also provided.
申请公布号 US8003303(B2) 申请公布日期 2011.08.23
申请号 US20090421378 申请日期 2009.04.09
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD 发明人 LIU GEORGE;CHEN KUEI SHUN;YEH CHIH-YANG;HUANG TE-CHIH
分类号 G03F7/00;G03F1/00 主分类号 G03F7/00
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