发明名称 Semiconductor device having a plurality of kinds of wells and manufacturing method thereof
摘要 A semiconductor device has a configuration in which more than three kinds of wells are formed with small level differences. One kind of well from among the more than three kinds of wells has a surface level higher than other kinds of wells from among the more than three kinds of wells. The one kind of well is formed adjacent to and self-aligned to at least one kind of well from among the other kinds of wells. The other kinds of wells are different in one of a conductivity type, an impurity concentration and a junction depth, and include at least two kinds of wells having the same surface level.
申请公布号 US8003476(B2) 申请公布日期 2011.08.23
申请号 US20080213676 申请日期 2008.06.23
申请人 RICOH COMPANY, LTD. 发明人 YOSHIDA MASAAKI;UEDA NAOHIRO;KIJIMA MASATO
分类号 H01L21/331;H01L21/761;H01L21/265;H01L21/8238;H01L21/8239;H01L27/01;H01L27/092 主分类号 H01L21/331
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