发明名称 Lithographic apparatus and substrate edge seal
摘要 A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.
申请公布号 US8003968(B2) 申请公布日期 2011.08.23
申请号 US20080219606 申请日期 2008.07.24
申请人 ASML NETHERLANDS B.V. 发明人 OTTENS JOOST JEROEN;JACOBS JOHANNES HENRICUS WILHELMUS;KEMPER NICOLAAS RUDOLF;LEENDERS MARTINUS HENDRIKUS ANTONIUS
分类号 G03F7/20;G03B27/52 主分类号 G03F7/20
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