PLASMA TREATMENT APPARATUS AND PLASMA TREATMENT METHOD

摘要

PURPOSE: A plasma processing apparatus and a method of processing plasma are provided to prevent damage to an object due to ion by suppressing the increase of electric field near the side of the object. CONSTITUTION: In a plasma processing apparatus and a method of processing plasma, a vacuum container(4) comprises an enclosure body(11) and a lid(12). The container main body comprises a bottom wall(11a) and a side wall(11b). The vacuum container comprises a reaction chamber in which the object is processed by plasma. A dielectric member(16) is installed in the reaction chamber to cover a slot plate. An electromagnetic wave transmission line includes one electromagnetic wave division plate and three electromagnetic wave radiation plates.