EXPOSURE APPARATUS, EXPOSURE METHOD AND METHOD FOR MANUFACTURING PANEL SUBSTRATE FOR DISPLAY

摘要

PROBLEM TO BE SOLVED: To expose a substrate to transfer a new pattern on a base pattern preliminarily formed on the substrate, in such a manner that the new pattern is transferred by exposure as aligned to the base pattern over the whole substrate even if distortion of the base pattern differs depending on a position within the substrate.

SOLUTION: The surface of a substrate 1 where a base pattern is formed and a photoresist is applied on the base pattern is divided into a plurality of segments; distortion of the base pattern is detected in each divided segment; and a drawing data is corrected in accordance with the distortion of the base pattern in each divided segment based on the detection results. The substrate 1 is mounted on a chuck 10; the chuck 10 and a light beam irradiation device 20 are relatively moved; and the substrate 1 is scanned with a light beam from the light beam irradiation device 20 to draw a pattern on the substrate 1. The light beam irradiation device 20 includes a spatial optical modulator modulating a light beam, a drive circuit driving the spatial optical modulator based on a drawing data, and an irradiation optical system for projecting the light beam modulated by the spatial optical modulator.

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