发明名称 LIQUID IMMERSION MEMBER, IMMERSION LITHOGRAPHY APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a liquid immersion member capable of suppressing the occurrence of an exposure defect. <P>SOLUTION: The liquid immersion member forms a liquid immersion space by holding a first liquid between the member and an object so that the optical path of an exposure light irradiated to the object is filled with the first liquid. The liquid immersion member includes a recovery opening for recovering at least part of the first liquid on the object, a supply opening arranged outside of the recovery opening to the optical path for supplying a second liquid when facing the first liquid and not supplying the second liquid when not facing the first liquid, a recovery flow channel in which at least part of the first liquid recovered from the recovery opening flows, a supply flow channel in which at least part of the second liquid supplied to the supply opening flows, and a connecting flow channel which connects at least part of the recovery flow channel and the supply flow channel. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011159865(A) 申请公布日期 2011.08.18
申请号 JP20100021365 申请日期 2010.02.02
申请人 NIKON CORP 发明人 SHIBAZAKI YUICHI;FUJIWARA TOMOHARU
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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