发明名称 METHOD OF MANUFACTURING FINE PATTERN
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a fine pattern that has an excellent pattern accuracy, and also has an excellent adhesion property with respect to a substrate and an excellent mold releasing property. <P>SOLUTION: The method of manufacturing a fine pattern at least includes steps (A) to (D) that are performed in this order: (A) layers formed of at least two kinds of curable compositions having different compositions are laminated, simultaneously or sequentially, on a substrate or a mold; (B) either the substrate or the mold on which the layers formed of curable compositions are not formed, is brought into contact with the layers formed of curable compositions to provide the layers formed of curable compositions between the substrate and the mold; (C) the curable compositions are cured; and (D) the mold is released from the cured layers formed of curable compositions. Out of the curable compositions, the one used in the layer adjacent to the substrate contains more adhesion enhancer than the one used for the layer in contact with the mold, and/or the one used in the layer adjacent to the mold contains more release agent than the one used for the layer adjacent to the substrate. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011159924(A) 申请公布日期 2011.08.18
申请号 JP20100022498 申请日期 2010.02.03
申请人 FUJIFILM CORP 发明人 YONEYAMA HIROYUKI;ANDO TAKESHI
分类号 H01L21/027 主分类号 H01L21/027
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