发明名称 APPARATUS AND METHOD FOR MEASURING TILT OF THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a tilt measurement apparatus and the like for thin film capable of accurately measuring the tilt of the thin film with a small footprint and at inexpensive equipment cost. SOLUTION: The tilt measurement apparatus 1 and the like for the thin film, which measures tiltϕto a circular plane of the thin film F formed on the circular plane of a circular substrate C, includes: a holder 17, 18, 27 and 31 for holding the circular substrate such that the circular plane copies a given plane; displacement measurement devices 13 and 50 for measuring a displacement from a reference position by moving the circular substrate hold by the holder over a given distance to a direction parallel to a given plane; a positioner 13 for positioning the circular substrate at a given position based on the displacement measured by the displacement measurement devices; height measurement devices 42, 43 and 44 for measuring heights from the circular plane of a number of points on the surface of the thin film formed on the circular plane of the circular substrate positioned by the positioner; and a tilt calculator for calculating the tilt to the circular plane of the thin film based on a measurement value from the height measurement devices. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011158441(A) 申请公布日期 2011.08.18
申请号 JP20100022677 申请日期 2010.02.04
申请人 NEC ENGINEERING LTD 发明人 ISHIZUKA TOSHIHIKO;TANI SHOSUKE
分类号 G01B5/24 主分类号 G01B5/24
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