发明名称 |
VAPOR DEPOSITION SYSTEM, METHOD OF MANUFACTURING LIGHT EMITTING DEVICE AND LIGHT EMITTING DEVICE |
摘要 |
There are provided a vapor deposition system, a method of manufacturing a light emitting device, and a light emitting device. A vapor deposition system according to an aspect of the invention may include: a first chamber having a first susceptor and at least one gas distributor discharging a gas in a direction parallel to a substrate disposed on the first susceptor; and a second chamber having a second susceptor and at least one second gas distributor arranged above the second susceptor to discharge a gas downwards. When a vapor deposition system according to an aspect of the invention is used, a semiconductor layer being thereby grown has excellent crystalline quality, thereby improving the performance of a light emitting device. Furthermore, while the operational capability and productivity of the vapor deposition system are improved, deterioration in an apparatus can be prevented.
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申请公布号 |
US2011198667(A1) |
申请公布日期 |
2011.08.18 |
申请号 |
US20100940399 |
申请日期 |
2010.11.05 |
申请人 |
LEE DONG JU;SHIM HYUN WOOK;LEE HEON HO;KIM YOUNG SUN;KIM SUNG TAE |
发明人 |
LEE DONG JU;SHIM HYUN WOOK;LEE HEON HO;KIM YOUNG SUN;KIM SUNG TAE |
分类号 |
H01L33/30;H01L33/00;H01L33/02 |
主分类号 |
H01L33/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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