发明名称 Semiconductor devices having contact plugs with stress buffer spacers and methods of fabricating the same
摘要 A semiconductor device includes an inorganic insulating layer on a semiconductor substrate, a contact plug that extends through the inorganic insulating layer to contact the semiconductor substrate and a stress buffer spacer disposed between the node contact plug and the inorganic insulating layer. The device further includes a thin-film transistor (TFT) disposed on the inorganic insulating layer and having a source/drain region extending along the inorganic insulating layer to contact the contact plug. The device may further include an etch stop layer interposed between the inorganic insulating layer and the semiconductor substrate.
申请公布号 US7998851(B2) 申请公布日期 2011.08.16
申请号 US20100715599 申请日期 2010.03.02
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SON YONG-HOON;SHIN YU-GYUN;LEE JONG-WOOK;LEE SUN-GHIL;JUNG IN-SOO;LEE YOUNG-EUN;LEE DEOK-HYUNG
分类号 H01L21/28;H01L21/36;H01L21/8234;H01L23/48;H01L23/52;H01L27/06;H01L29/40 主分类号 H01L21/28
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