发明名称 RESISTIVE MEMORY AND METHODS OF PROCESSING RESISTIVE MEMORY
摘要 Resistive memory and methods of processing resistive memory are described herein. One or more method embodiments of processing resistive memory include conformally forming a cell material in an opening in an interlayer dielectric such that a seam is formed in the cell material, forming a conductive pathway by modifying the seam, and forming an electrode on the cell material and the seam.
申请公布号 US2011193044(A1) 申请公布日期 2011.08.11
申请号 US20100701885 申请日期 2010.02.08
申请人 MICRON TECHNOLOGY, INC. 发明人 SANDHU GURTEJ S.;SMYTHE JOHN
分类号 H01L45/00;H01L21/20 主分类号 H01L45/00
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