| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an active light-sensitive or radiation-sensitive resin composition, and a pattern forming method and a resist film using the same, which form a pattern satisfying high sensitivity, high resolution and favorable line width roughness at the same time. <P>SOLUTION: The active light-sensitive or radiation-sensitive resin composition contains (A) resin containing a repeating unit expressed by the formula (1) and (B) a chemical compound caused to generate acid by irradiation of active light or radiation. The pattern forming method and the resist film use the resin composition. In the formula (1), R<SB>1</SB>-R<SB>4</SB>each independently indicate a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or a group in which two or more of these groups are connected by single bond or bivalent combination group. At least one of R<SB>3</SB>and R<SB>4</SB>indicates groups other than a hydrogen atom. n indicates integers of 0-4. <P>COPYRIGHT: (C)2011,JPO&INPIT |
