| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent the formation of a deep recess in an unintended part when a resist film is exposed and developed. <P>SOLUTION: Layout information indicating the arrangement of four mutually adjacent connecting holes formed on an insulating film is acquired (step S10 and step S20). Whether a quadrilateral using the center of the four connecting holes as an apex is a square or a rectangle and the length (l) of the diagonal of the square or the rectangle satisfies formula (1) l=2αλ±a, α=1/(2sinθ) are decided (step S30). When formula (1) is satisfied, at least one position of the four connecting holes is displaced (step S40). In the formula, θ is an angle of incidence of light when the resist film for forming the connecting holes is exposed, λ is the wavelength of the light, and (a) is the diameters of the connecting holes. <P>COPYRIGHT: (C)2011,JPO&INPIT |
