发明名称 |
Method for making nanowires and apparatus containing them |
摘要 |
A method for producing nanowires comprising:
a) depositing a masking material over a substrate comprising silicon;
b) removing the masking material using a first process that removes the masking material in preference to silicon;
c) removing silicon using a second process that removes silicon in preference to the masking material;
d) continuously repeating the sequence of steps a), b) and c) to control the creation of nanowires; and
e) stopping repetition of the sequence of steps a), b) and c).
An apparatus containing these nanowires is also disclosed. |
申请公布号 |
EP2270265(A3) |
申请公布日期 |
2011.08.10 |
申请号 |
EP20100162497 |
申请日期 |
2010.05.11 |
申请人 |
NOKIA CORPORATION |
发明人 |
COLLI, ALAN;HIRALAL, PRITESH |
分类号 |
C30B29/62;C30B29/06;C30B29/60;C30B33/12;H01M4/134;H01M4/1395;H01M4/36;H01M10/052 |
主分类号 |
C30B29/62 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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