| 发明名称 |
TARC material for immersion watermark reduction |
| 摘要 |
A coating material disposed overlying a photo sensitive layer during an immersion lithography process includes a polymer that is substantially insoluble to an immersion fluid and an acid capable of neutralizing a base quencher from the photo sensitive layer.
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| 申请公布号 |
US7993808(B2) |
申请公布日期 |
2011.08.09 |
| 申请号 |
US20060324588 |
申请日期 |
2006.01.03 |
| 申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
CHANG CHING-YU |
| 分类号 |
G03F7/00;G03F7/004 |
主分类号 |
G03F7/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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