发明名称 |
Polishing composition and method utilizing abrasive particles treated with an aminosilane |
摘要 |
The inventive method comprises chemically-mechanically polishing a substrate with an inventive polishing composition comprising a liquid carrier, a cationic polymer, an acid, and abrasive particles that have been treated with an aminosilane compound.
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申请公布号 |
US7994057(B2) |
申请公布日期 |
2011.08.09 |
申请号 |
US20080234173 |
申请日期 |
2008.09.19 |
申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
DYSARD JEFFREY;ANJUR SRIRAM;GRUMBINE STEVEN;WHITE DANIELA;WARD WILLIAM |
分类号 |
H01L21/302;H01L21/461 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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