发明名称 Apparatus and Method for Quantatively Measuring Liquid Film Drying Rates on Substrates
摘要 An apparatus and method for measuring the drying rate of a liquid or liquid film in air or other gaseous media by either: a) measuring changes in the print density of the liquid; b) measuring changes in the dynamic surface tension of the liquid; c) measuring the differential pressure between an inert gas required to displace a sample of the liquid drawn into a capillary tube from a reservoir of the liquid and the pressure required for a bubble of the gas to form in the reservoir; and d) measuring the electrical conductance or resistance of the liquid.
申请公布号 US2011185804(A1) 申请公布日期 2011.08.04
申请号 US20110984367 申请日期 2011.01.04
申请人 SUN CHEMICAL CORPORATION 发明人 SPRYCHA RYSZARD;SMITH DOREEN;BIRO DAVID;PARRIS JUANITA;LAKSIN MIKHAIL;PACE GREGORY
分类号 G01N33/00;G01N33/32 主分类号 G01N33/00
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