发明名称 |
Apparatus and Method for Quantatively Measuring Liquid Film Drying Rates on Substrates |
摘要 |
An apparatus and method for measuring the drying rate of a liquid or liquid film in air or other gaseous media by either: a) measuring changes in the print density of the liquid; b) measuring changes in the dynamic surface tension of the liquid; c) measuring the differential pressure between an inert gas required to displace a sample of the liquid drawn into a capillary tube from a reservoir of the liquid and the pressure required for a bubble of the gas to form in the reservoir; and d) measuring the electrical conductance or resistance of the liquid.
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申请公布号 |
US2011185804(A1) |
申请公布日期 |
2011.08.04 |
申请号 |
US20110984367 |
申请日期 |
2011.01.04 |
申请人 |
SUN CHEMICAL CORPORATION |
发明人 |
SPRYCHA RYSZARD;SMITH DOREEN;BIRO DAVID;PARRIS JUANITA;LAKSIN MIKHAIL;PACE GREGORY |
分类号 |
G01N33/00;G01N33/32 |
主分类号 |
G01N33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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