发明名称 |
METHOD OF MANUFACTURING DISPLAY DEVICE, AND DISPLAY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a display device that hardly causes peeling of a drain electrode and a source electrode even when the drain electrode and source electrode using copper are exposed on a substrate when performing hydrogen termination processing of a semiconductor layer. SOLUTION: The method of manufacturing the display device having the substrate arranged with a plurality of thin film transistors includes: an electrode forming step of forming the source electrode and drain electrode including a single layer or a plurality of conductive layers on a part of the semiconductor layer of the thin film transistor; and a hydrogen termination step of applying the hydrogen termination processing to the semiconductor layer with the source electrode and drain electrode exposed on the substrate. The electrode forming process includes a step of sticking copper on the substrate by introducing inert gas containing neon. COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011150152(A) |
申请公布日期 |
2011.08.04 |
申请号 |
JP20100011665 |
申请日期 |
2010.01.22 |
申请人 |
HITACHI DISPLAYS LTD;PANASONIC LIQUID CRYSTAL DISPLAY CO LTD |
发明人 |
TAKAHASHI TAKUYA;SUZUKI TAKAAKI;ASANUMA HARUHIKO |
分类号 |
G09F9/30;G02F1/1368;H01L21/28;H01L21/285;H01L21/336;H01L29/417;H01L29/786;H01L51/50;H05B33/10 |
主分类号 |
G09F9/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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