发明名称 VACUUM PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus that is improved in production efficiency by shortening a stop time of the apparatus. SOLUTION: The vacuum processing apparatus includes a transfer container for transferring a wafer to be processed in the internal space, a vacuum container coupled to the sidewall of the transfer container and including a processing chamber having a sample stage therein on which the wafer is mounted, a lid member opened or closed by rotation above the vacuum container, an inner chamber member arranged in the vacuum container and making up the inner wall of the processing chamber, and a jig coupled to the sidewall of the vacuum container to lift and hold the inner chamber member by being coupled thereto. The jig includes a first joint portion having vertical and horizontal shafts, a length-extensible arm portion rotatable around each shaft of the first joint portion, and a second joint portion in which the coupled inner chamber member can rotate around the horizontal axis thereof while arranged at a tip portion of the arm portion. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011151098(A) 申请公布日期 2011.08.04
申请号 JP20100009615 申请日期 2010.01.20
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 NAKAMURA TSUTOMU;TANIMURA HIDENORI;MIZOBE YUYA
分类号 H01L21/02;H01L21/3065 主分类号 H01L21/02
代理机构 代理人
主权项
地址