发明名称 |
PHOTOLATENT AMIDINE BASES FOR REDOX CURING OF RADICALLY CURABLE FORMULATIONS |
摘要 |
The invention pertains to photolatent amidine bases for redox curing of radically curable formulations, that is a composition comprising (a1) a photolatent amidine base; or (a2) a photolatent amine base; or (a3) a mixture of (a1) and (a2); and (b) a radically polymerizable compound; and (c) a free radical initiator capable to be reduced by amines and/or amidines, in particular a peroxide.
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申请公布号 |
US2011190412(A1) |
申请公布日期 |
2011.08.04 |
申请号 |
US20090812795 |
申请日期 |
2009.01.06 |
申请人 |
BASF SE |
发明人 |
STUDER KATIA;DIETLIKER KURT;JUNG TUNJA |
分类号 |
C08J3/28;C08F122/10;C08F122/22;C08F222/22 |
主分类号 |
C08J3/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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