发明名称 PHOTOLATENT AMIDINE BASES FOR REDOX CURING OF RADICALLY CURABLE FORMULATIONS
摘要 The invention pertains to photolatent amidine bases for redox curing of radically curable formulations, that is a composition comprising (a1) a photolatent amidine base; or (a2) a photolatent amine base; or (a3) a mixture of (a1) and (a2); and (b) a radically polymerizable compound; and (c) a free radical initiator capable to be reduced by amines and/or amidines, in particular a peroxide.
申请公布号 US2011190412(A1) 申请公布日期 2011.08.04
申请号 US20090812795 申请日期 2009.01.06
申请人 BASF SE 发明人 STUDER KATIA;DIETLIKER KURT;JUNG TUNJA
分类号 C08J3/28;C08F122/10;C08F122/22;C08F222/22 主分类号 C08J3/28
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