DRY ETCHING AGENT AND DRY ETCHING METHOD USING THE SAME

摘要

Provided is a dry etching agent containing fluorinated propyne represented by the chemical formula CF3C=CX (where X is H, F, Cl, Br, I, CH3, CFH2, or CF2H), and either (B) at least one gas selected from the group consisting of O2, O3, CO, CO2, COCl2, and COF2, (C) at least one gas selected from the group consisting of F2, NF3, Cl2, Br2, I2, and YFn (where Y is Cl, Br, or I and n is an integer such that 1=n=5), and (D) at least one gas selected from the group consisting of CF4, CHF3, C2F6, C2F5H, C2F4H2, C3F8, C3F4H2, C3ClF3H, and C4F8. There is little stress placed on the environment, the process window is large, and the agent is suitable for processing that requires a high aspect ratio without special substrate excitation processing or the like.