发明名称 DEVICE FOR MEASURING DEFORMATION OF METAL THIN FILM DUE TO STRESS AND ITS METHODS
摘要 PURPOSE: An automatic device and method for measuring the stress change of nano metal thin film are provided to consecutively follow the change of the resonant frequency. CONSTITUTION: An automatic device for measuring the stress change of nano metal thin film comprises a detection unit, an amplifier, a fixing signal generator, and an adaptation signal generator. The detection unit sanctions the excitation wave in the test piece. The resonant frequency resonating is measured by the detection unit according to the applied excitation wave. The amplifier amplifies the resonant frequency to the detectable voltage. The adaptation signal generator applies the source signal of fixed size to an output signal of fixed size regardless of the deviation of the test piece.
申请公布号 KR101053918(B1) 申请公布日期 2011.08.04
申请号 KR20100129904 申请日期 2010.12.17
申请人 KOREA INSTITUTE OF MACHINERY & MATERIALS 发明人 HYUN, SEUNG MIN;HWANG, BO YUN;LEE, HAK JOO
分类号 G01L1/00;G01B15/06;G01N23/00 主分类号 G01L1/00
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